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Integrated silicon circuits, present in everything from coffeemakers to computers, are very thin—but researchers think they can push thin-film boundaries to the single-atom level.
The material of choice is graphene, single atom-thick sheets of repeating carbon atoms, and hexagonal boron nitride, similarly thin sheets of repeating boron and nitrogen atoms.
A team led by Jiwoong Park, assistant professor of chemistry and chemical biology at Cornell University, has invented a way to pattern single atom films of graphene and boron nitride, an insulator, without the use of a silicon substrate. The work is detailed in an article published online in the journal Nature.

Integrated silicon circuits, present in everything from coffeemakers to computers, are very thin—but researchers think they can push thin-film boundaries to the single-atom level.

The material of choice is graphene, single atom-thick sheets of repeating carbon atoms, and hexagonal boron nitride, similarly thin sheets of repeating boron and nitrogen atoms.

A team led by Jiwoong Park, assistant professor of chemistry and chemical biology at Cornell University, has invented a way to pattern single atom films of graphene and boron nitride, an insulator, without the use of a silicon substrate. The work is detailed in an article published online in the journal Nature.

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